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Overview
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Sputtering technique are frequently used to create a thin film of Zinc Sulfide . The ZnS target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zinc Sulfide in this case, to create athin film of ZnS on the surface of the substrate.
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- Properties
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Overview
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