Cobalt Aluminum (Co/Al) Sputtering Targets

Cobalt Aluminum (Co/Al) Sputtering Targets

Catalog Number:
ST01502837QSA
Mfr. No.:
DPMA27ST-1
Price:
$439
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      • Overview
        • Cobalt aluminum (CoAl) is an intermetallic compound with a high melting point, good thermal stability, and interesting magnetic properties. It can be used in the fabrication of permanent magnets, high-temperature electronics, and magnetic sensors. CoAl thin films can be deposited using techniques like sputtering, allowing for their integration into microelectronic and MEMS devices. The materials combination of magnetic, electrical, and thermal properties, along with its compatibility with semiconductor processing, makes it a valuable component in the development of advanced magnetic and high-temperature electronic applications.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          7440-48-4 and 7429-90-5
          Molecular Formula
          Co/Al
          Other Properties
          Composition: Cobalt and Aluminum
          Purity: 99.9% ~ 99.99%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of Co/Al sputtering target: 3 weeks

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