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Overview
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Sputtering technique are frequently used to create a thin film of Zirconium Silicide. The ZrSi2 target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium Silicide in this case, to create athin film of ZrSi2 on the surface of the substrate.
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