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Overview
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Sputtering technique are frequently used to create a thin film of Titanium Dioxide . The TiO2 target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Titanium Dioxide in this case, to create athin film of TiO2 on the surface of the substrate.
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- Properties
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