Tantalum (Ta) Sputtering Targets

Tantalum (Ta) Sputtering Targets

Catalog Number:
ST01502875QSA
Mfr. No.:
DPMA73ST
Price:
$740
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      • Overview
        • Tantalum (Ta) is a refractory metal with excellent corrosion resistance and high melting point. It is used in electronic components such as capacitors, high-temperature alloys, and medical implants. In the semiconductor industry, tantalum is used for thin-film resistors and as a diffusion barrier in integrated circuits. Thin films of tantalum can be deposited using sputtering and evaporation techniques, providing reliable and durable layers for various high-performance applications.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          7440-25-7
          Molecular Formula
          Ta
          Other Properties
          Composition: Tantalum
          Purity: 99.9% ~ 99.95%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of Ta sputtering target: 3 weeks

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