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Overview
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Silicon Nitride (Si3N4) is a robust, hard ceramic material with excellent thermal and chemical stability. It is used in semiconductor devices as an insulating layer, a passivation layer to protect surfaces, and as a dielectric material in capacitors. Thin films of silicon nitride can be deposited using techniques such as plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD), creating high-quality films for various electronic and protective applications.
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Overview
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