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Silicon Nitride (Si3N4) Sputtering Targets

Silicon Nitride (Si3N4) Sputtering Targets

Catalog Number:

ST01502879QSA

Mfr. No.:

DPND14ST

Price:

$625

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- Overview
  - Silicon Nitride (Si3N4) is a robust, hard ceramic material with excellent thermal and chemical stability. It is used in semiconductor devices as an insulating layer, a passivation layer to protect surfaces, and as a dielectric material in capacitors. Thin films of silicon nitride can be deposited using techniques such as plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD), creating high-quality films for various electronic and protective applications.
    
    Please contact us at for specific academic pricing.
- Properties
  - Categories
    
    High Purity Materials
    
    CAS Number
    
    12033-89-5
    
    Molecular Formula
    
    Si3N4
    
    Other Properties
    
    Composition: Silicon Nitride (Si3N4)
    Purity: 99.5% ~ 99.9%
    Max. dia. of flat disc sputter target:
    Typical lead time of Si3N4 sputtering target: 4 weeks

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