Zirconium Nitride (ZrN) Sputtering Targets

Zirconium Nitride (ZrN) Sputtering Targets

Catalog Number:
ST01502881QSA
Mfr. No.:
DPND40ST
Price:
$710
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      • Overview
        • Sputtering technique are frequently used to create a thin film of Zirconium nitride. The ZrN target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium nitride in this case, to create athin film of ZrN on the surface of the substrate.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          25658-42-8
          Molecular Formula
          ZrN
          Other Properties
          Composition: Zirconium Nitride
          Purity: 99.5%
          Max. dia. of flat disc sputter target: 12"
          Typical lead time of ZrN sputtering target: 4 weeks

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