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Overview
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Sputtering technique are frequently used to create a thin film of Zirconium nitride. The ZrN target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium nitride in this case, to create athin film of ZrN on the surface of the substrate.
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- Properties
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Overview