Cobalt Oxide (CoO/Co2O3/Co3O4) Sputtering Targets

Cobalt Oxide (CoO/Co2O3/Co3O4) Sputtering Targets

Catalog Number:
ST01502739QSA
Mfr. No.:
DPOX27ST
Price:
$682
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      • Overview
        • Cobalt(III) oxide (Co2O3) is a ceramic material with a wide bandgap and interesting electronic and catalytic properties. It can exhibit p-type semiconductor behavior, making it useful in the fabrication of transparent conductive oxides, gas sensors, and electrochemical devices. Co2O3 thin films can be deposited using techniques like sputtering or chemical vapor deposition, enabling their integration into electronic and optoelectronic device architectures. The materials unique redox properties and ability to catalyze various chemical reactions also make it a potential candidate for use in energy conversion and storage applications, such as fuel cells and water electrolysis. The versatility of Co2O3 and its ability to be combined with other materials allow for the development of multifunctional devices and systems.

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      • Properties
        • Categories
          High Purity Materials
          Molecular Formula
          CoO/Co2O3/Co3O4
          Other Properties
          Composition: Co2O3(CoO/Co2O3/Co3O4)
          Purity: 99.9% ~ 99.99%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of CoO/Co2O3/Co3O4 sputtering target: 4 weeks

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