Chromium Silicide (CrSi2) Sputtering Target

Chromium silicides, such as chromium disilicide (CrSi2) and chromium monosilicide (CrSi), are refractory ceramic materials with unique electrical and thermal properties. They exhibit high melting points, good thermal and electrical conductivity, and compatibility with silicon-based semiconductor processing. Chromium silicides can be used as contact materials, interconnects, and diffusion barriers in integrated circuits to improve device performance and reliability. These materials can be deposited as thin films using techniques like sputtering or chemical vapor deposition, enabling their integration into advanced microelectronic device structures. The ability to tailor the composition and microstructure of chromium silicides allows for the optimization of their electrical, thermal, and mechanical properties for various electronic and optoelectronic applications.

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