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Iron Silicide (FeSi2) Sputtering Target

Iron Silicide (FeSi2) Sputtering Target

Catalog Number:

ST01502704QSA

Mfr. No.:

DPSI26ST

Price:

$758

Size:

Quantity:

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- Overview
  - Iron Disilicide (FeSi2) is a semiconductor material with potential applications in thermoelectric devices and infrared detectors. It exhibits good electrical conductivity and thermal stability. Thin films of FeSi2 can be deposited using sputtering to create efficient thermoelectric materials and infrared sensing components.
    
    Please contact us at for specific academic pricing.
- Properties
  - Categories
    
    High Purity Materials
    
    Molecular Formula
    
    FeSi2
    
    Other Properties
    
    Composition: FeSi2
    Purity: 99.9%
    Max. dia. of flat disc sputter target: 14"
    Typical lead time of FeSi2 sputtering target: 4 weeks

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