Calcium Fluoride (CaF2) Sputtering Targets

Calcium fluoride (CaF2) plays a significant role in the field of thin film deposition and coating processes, particularly in physical vapor deposition (PVD) techniques. As a sputter target material, calcium fluoride is widely used in sputtering systems to deposit thin films onto various substrates.
In PVD, a high-purity calcium fluoride sputter target, usually flat disc, is bombarded with energetic ions (typically argon) in a low-pressure gas environment. This bombardment dislodges atoms from the target surface, which then deposit as a thin film onto the substrate placed in the deposition chamber. The resulting calcium fluoride thin films exhibit excellent optical properties, such as high transparency and low absorption in the ultraviolet, visible, and infrared regions.
These calcium fluoride coatings find applications in various industries, including optics, telecommunications, and electronics. They can be used as anti-reflective coatings on optical components like lenses, mirrors, and windows to minimize light reflection and maximize transmission. Calcium fluoride coatings also serve as protective layers, providing resistance against chemicals, moisture, and abrasion.
Furthermore, calcium fluoride disc sputter targets are utilized in the manufacturing of other fluoride-based thin films and multilayer coatings. By controlling the deposition parameters and composition, precise control over the film thickness, composition, and optical properties can be achieved.

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