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Overview
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Sputtering technique are frequently used to create a thin film of Bismuth Ferrite . The BiFeO3 target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Bismuth Ferrite in this case, to create athin film of BiFeO3 on the surface of the substrate.
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- Properties
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Overview
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