Copper Aluminum Oxide (CuAlO2) Sputtering Targets

Copper aluminum oxide, also known as copper aluminate (CuAl2O4), is a ceramic material with a spinel-type crystal structure. It exhibits p-type semiconductor behavior and has a wide bandgap, making it useful for applications in transparent conductive electrodes, gas sensors, and catalytic devices. Copper aluminum oxide thin films can be deposited using techniques like sputtering or chemical vapor deposition, allowing for their integration into electronic and optoelectronic device architectures. The materials good thermal and chemical stability, as well as its optical transparency, contribute to its versatility in various applications that require functional oxide materials. Ongoing research focuses on optimizing the deposition and processing of copper aluminum oxide to further enhance its performance in emerging electronic and energy technologies.;

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