Aluminum Silicon (AlSi) Sputtering Target

AlSi, or aluminum-silicon, is a widely used alloy in the semiconductor industry. The incorporation of silicon into the aluminum matrix improves the alloys mechanical strength, thermal stability, and electromigration resistance, making it suitable for use as interconnects, contacts, and metallization layers in integrated circuits. The AlSi alloy can be deposited using various thin-film deposition techniques, such as physical vapor deposition or chemical vapor deposition, including sputtering, and then patterned using standard semiconductor fabrication processes. The ability to optimize the Si content and control the microstructure of AlSi enables the development of reliable and high-performance interconnect and contact solutions for advanced electronic devices.

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