Tungsten Sulfide (WS2) Sputtering Targets

Tungsten sulfide (WS2) is another member of the transition metal dichalcogenide (TMD) family, exhibiting a layered structure similar to that of WSe2. It has a hexagonal crystal structure and possesses unique electronic and optical properties. Thin films of WS2 can be deposited using sputtering techniques, enabling the fabrication of high-quality and uniform layers. Sputtered WS2 films have attracted significant interest for their potential applications in optoelectronics, energy storage, and catalysis. The layered nature of WS2 allows for the formation of atomically thin films with excellent carrier mobility and strong light-matter interactions. These properties make WS2 suitable for the development of high-performance photodetectors, solar cells, and light-emitting diodes (LEDs). Additionally, WS2 has shown promise as an electrode material in supercapacitors and as a catalyst for hydrogen evolution reactions. The ability to deposit WS2 by sputtering has greatly facilitated the study and application of this material in various technological fields, opening up new avenues for the development of advanced electronic and energy devices.

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