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SrInO3 Sputtering Target

SrInO3 Sputtering Target

Catalog Number:

ST01502653QSA

Mfr. No.:

DPMO219ST

Price:

$780

Size:

Quantity:

Add to Cart:

- Overview
  - Sputtering technique are frequently used to create a thin film of SrInO3. The SrInO3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by SrInO3 in this case, to create a thin film of SrInO3 on the surface of the substrate.
    
    Please contact us at for specific academic pricing.
- Properties
  - Categories
    
    Deposition Materials
    
    Molecular Formula
    
    SrInO3
    
    Other Properties
    
    Composition: SrInO3
    Purity: >99.5%
    
    Max. dia. of flat sputter target: 14"
    Typical lead time of SrInO3 sputtering target: 4 weeks

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