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Overview
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Sputtering technique are frequently used to create a thin film of SrInO3. The SrInO3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by SrInO3 in this case, to create a thin film of SrInO3 on the surface of the substrate.
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- Properties
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Overview
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