Sr3Al2O6 Sputtering Target

Sr3Al2O6 (SAO) is a compound with a perovskite structure exhibiting excellent optical, electrical and thermal stability properties. It possesses broad application potential in various fields.
Specifically regarding optics, Sr3Al2O6 demonstrates good optical characteristics including high transparency and relatively low refractive index. It transmits strongly in the ultraviolet through near infrared range. As a result, Sr3Al2O6 shows promise for optical applications such as windows, lenses and sensors. Commonly, sputtering is used to obtain Sr3Al2O6 coatings. Here, a solid Sr3Al2O6 disc serves as the sputter target or source material actively depositing thin films.
Additionally, due to its perovskite structure and special ion arrangement, Sr3Al2O6 displays some electrical traits. It actively exhibits ferroelectric properties, the ability to self-polarize, within certain temperature scopes. Thus Sr3Al2O6 has prospective usage in electronic and storage devices including ferroelectric RAM and capacitors. Furthermore, thin film coating techniques like sputtering actively deposit multiple materials during semiconductor manufacturing. As a result, Sr3Al2O6 sputter targets serve as consumables producing devices containing Sr3Al2O6 films.
In summary, the stable qualities of SAO give it diverse applications through specialized deposition methods leveraging its optical and electrical characteristics.
The sputtering deposition of Sr3Al2O6 thin films requires several key stages. Firstly, use hot pressing sintering to make Sr3Al2O6 powder into a solid disk, to form the sputtering target. Next, installs the prepared target into the system, which comprises a vacuum chamber, target gun, and substrate holder positioned at an optimal angle and distance. Furthermore, substrate preparation entails choosing a suitable material like glass or silicon, followed by cleaning and surface treatment to ensure good adhesion. The deposition process then pumps down the chamber to vacuum prior to bombardment of the Sr3Al2O6 target using an inert gas ion beam. This releases atoms depositing the thin film onto the substrate surface upon heating. Additionally, manipulating parameters such as sputtering power and temperature controls the film properties and thickness during deposition. Lastly, post-deposition treatments including annealing optimize crystallinity and performance following sputtering completion.

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