Silicon (Si) (N-type) Sputtering Targets

N-type Silicon is a type of silicon that has been doped with elements such as phosphorus, arsenic, or antimony to add extra electrons, creating more free electrons than holes. This type of silicon is used extensively in the semiconductor industry to create electronic components such as transistors and diodes. N-type silicon is crucial for forming the negative side of p-n junctions in devices like solar cells and integrated circuits. Thin films of N-type silicon can be deposited using techniques such as chemical vapor deposition (CVD) and molecular beam epitaxy (MBE), providing high-purity materials for advanced electronic applications.

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