Silicon Dioxide (SiO2) Sputtering Targets

Silicon Dioxide (SiO2) Sputtering Targets

Catalog Number:
ST01502755QSA
Mfr. No.:
DPOX14ST-1
Price:
$392
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      • Overview
        • Silicon Dioxide (SiO2) is a widely used insulating material in the semiconductor industry, known for its excellent dielectric properties and thermal stability. It is used as a gate oxide in MOSFETs, as an insulator in capacitors, and as a protective layer in various electronic devices. Thin films of SiO2 can be deposited using techniques such as thermal oxidation, CVD, and sputtering, providing high-quality insulating layers for advanced electronic applications.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          7631-86-9
          Molecular Formula
          SiO2
          Other Properties
          Composition: Silicon Dioxide (SiO2)
          Purity: 99.9% ~ 99.995%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of SiO2 sputtering target: 3 weeks

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