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Silicon Dioxide (SiO2) Sputtering Targets

Silicon Dioxide (SiO2) Sputtering Targets

Catalog Number:

ST01502755QSA

Mfr. No.:

DPOX14ST-1

Price:

$392

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- Overview
  - Silicon Dioxide (SiO2) is a widely used insulating material in the semiconductor industry, known for its excellent dielectric properties and thermal stability. It is used as a gate oxide in MOSFETs, as an insulator in capacitors, and as a protective layer in various electronic devices. Thin films of SiO2 can be deposited using techniques such as thermal oxidation, CVD, and sputtering, providing high-quality insulating layers for advanced electronic applications.
    
    Please contact us at for specific academic pricing.
- Properties
  - Categories
    
    High Purity Materials
    
    CAS Number
    
    7631-86-9
    
    Molecular Formula
    
    SiO2
    
    Other Properties
    
    Composition: Silicon Dioxide (SiO2)
    Purity: 99.9% ~ 99.995%
    Max. dia. of flat disc sputter target: 18"
    Typical lead time of SiO2 sputtering target: 3 weeks

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