Nickel Ferrite (NiFe2O4) Sputtering Target

Nickel ferrite (NiFe2O4) thin films fabricated using NiFe2O4 sputtering targets can be applied in fields such as magnetic materials, electronic devices, and optoelectronic materials. These thin films have potential application prospects in areas including magnetic storage, magnetic sensing, electronic devices, and optoelectronic conversion.
Magnetic characteristics employ magnetic material and device manufacturing. Magnetron sputtering deposits nano-scale nickel ferrite layers on substrates, forming magnetic layers. Such films produce magnetic sensors, memory devices and MRAMs. Target use ensures film composition and purity, controlling magnetic traits.
Semiconductor qualities present potential for electronics. Physical vapor deposition forms thin film resistors, magnetoresistive sensors and magnetic memory by utilizing nickel ferrite's unique electronic nature to regulate resistance, sense fields and store information.
Optoelectronic applications also exist. Nickel ferrite films suit solar cell, photonic device and photocatalytic material production. Sputtered from high purity targets, uniform composition enhances photoconversion and light absorption efficiency. Resulting films power light-driven water splitting, photovoltaics and photochemistry.
As a mixed oxide, Nickel Ferrite (NiFe2O4) should be a one phase material. It is somehow a informal name for an oxide compound that contains more than one cations (Ni and Fe in this case). A NiFe2O4 sputter target is usually made by high temperature sinttering/recrystallization the mixture of the oxide compound of Ni and Fe.In order to make the Nickel Ferrite(NiFe2O4) targets, the single phase NiFe2O4 material was ground down to powder and sintered again. Nickel Ferrite has quite special physical properties and have special applications in electronic, superconductive and optic industries. For Nickel Ferrite(NiFe2O4) sputter target, indium bonding to simple or custom made backing plate is available

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