Potassium Niobate (KNbO3) Sputtering Target

Potassium niobate (KNbO3) is a key ferroelectric material possessing ferroelectric, optical, and electro-optic properties alongside piezoelectricity. It sees wide use in electronics, optics, optoelectronics, and acoustic devices.
As a ferroelectric, KNbO3 can self-polarize and generate charge separation or polarization under external electric fields. This makes it ideally suited for electronics and memory applications such as ferroelectric random-access memory (FRAM), charge-coupled devices (CCD), and piezoelectric sensors. Thin film coating technology is often employed during semiconductor production of such devices, with KNbO3 sputtering targets commonly used.
KNbO3 additionally exhibits favorable optical characteristics including a broad bandgap and high transparency in the ultraviolet to near-infrared spectrum. Sputtered KNbO3 targets enable physical vapor deposition to manufacture optical and photonic devices like waveguides, fiber optics, and photodetectors.
KNbO3 is also piezoelectric, converting mechanical stress into electrical signals. This property provides potential for acoustic sensors, pressure sensors and surface acoustic wave devices.
KNbO3 Sputter Target
Potassium Niobate (KNbO3) is a one-phase material, which is synthesized by mixing potassium oxide and niobium oxide together through solid-phase synthesis. The resulting mixture is then ground down to a powder and sintered to obtain purified single-phase KNbO3 material.
For the production of Potassium Niobate (KNbO3) sputter targets, the purified KNbO3 material can be used. The sputter target can be prepared by bonding the KNbO3 material to a backing plate, either a standard backing plate or a custom-made one, using indium bonding. This bonding process ensures good adhesion between the KNbO3 material and the backing plate, allowing for efficient sputtering during the deposition process.

Please contact us at for specific academic pricing.