Chromium Doped Silicon Monoxide (Cr-SiO) Sputtering Targets

Silicon monoxide (SiO) is a semiconductor material with a wide bandgap and unique optical properties. It can be used as a dielectric or insulating layer in various electronic and optoelectronic devices, such as thin-film transistors, integrated circuits, and solar cells. SiO exhibits good thermal stability, chemical resistance, and electrical insulating properties, making it suitable for use as a passivation layer, gate dielectric, or barrier material. The material can be deposited as thin films using techniques like sputtering or thermal evaporation, allowing for its integration into semiconductor fabrication processes. SiOs optical transparency and refractive index also make it useful in optical coatings and waveguide applications.

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