Boron (B) Sputtering Targets

Boron (B) Sputtering Targets

Catalog Number:
ST01502852QSA
Mfr. No.:
DPME5ST
Price:
$812
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      • Overview
        • Boron is a metalloid element with unique electronic and optical properties. It can be used as a dopant in semiconductor materials, such as silicon, to modify their electrical characteristics and improve device performance. Boron-doped silicon is commonly used in the fabrication of p-type semiconductor devices, such as transistors and solar cells. Additionally, boron compounds like boron carbide (B4C) and boron nitride (BN) have potential applications in electronic and optoelectronic devices due to their wide bandgaps, high thermal conductivity, and exceptional mechanical properties. The versatility of boron-based materials makes them valuable for a range of electronic, energy, and defense-related applications.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          7440-42-8
          Molecular Formula
          Boron
          Other Properties
          Composition: Boron
          Purity: 99.5%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of Boron sputtering target: 3 weeks

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