ATO (Sb2O3/SnO2) Sputtering Targets

ATO (Sb2O3/SnO2) Sputtering Targets

Catalog Number:
ST01502662QSA
Mfr. No.:
DPATOST-2
Price:
$761
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      • Overview
        • Sputtering technique are frequently used to create a thin film of ATO . The Sb2O3/SnO2 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by ATO in this case, to create a thin film of ATO on the surface of the substrate.

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      • Properties
        • Categories
          Deposition Materials
          CAS Number
          18282-10-5
          Molecular Formula
          Al2O3/SnO2
          Other Properties
          Composition: ATO (Sb2O3/SnO2)
          Max. dia. of flat disc sputter target: 14"
          Typical lead time of ATO sputtering target: 4 weeks

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