Aluminum Oxide (Al2O3) Sputtering Targets

Aluminum Oxide (Al2O3) Sputtering Targets

Catalog Number:
ST01502733QSA
Mfr. No.:
DPOX13ST
Price:
$435
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      • Overview
        • Aluminum oxide, commonly known as alumina (Al2O3), is a versatile ceramic material with a wide range of applications in the electronics and optoelectronics industries. It has excellent dielectric properties, high electrical resistance, and good thermal stability, making it suitable for use as a gate dielectric, passivation layer, and insulating substrate in semiconductor devices. Al2O3 can also be used as a transparent optical material in applications such as laser windows, optical filters, and waveguides. The materials high hardness and wear resistance make it a candidate for protective coatings and mechanical components in microelectromechanical systems (MEMS) and optoelectronic devices. Al2O3 thin films can be deposited using techniques like sputtering.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          1344-28-1
          Molecular Formula
          Al2O3
          Other Properties
          Composition: Aluminum Oxide (Al2O3)
          Purity: 99.9% ~ 99.995%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of Al2O3 sputtering target: 3 weeks

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