Aluminum Fluoride (AlF3) Sputtering Targets

Aluminum fluoride (AlF3) is a ceramic material with a wide bandgap and excellent dielectric properties. It is used as a protective coating or passivation layer in various electronic and optoelectronic applications. AlF3 exhibits high thermal and chemical stability, making it suitable for use in harsh environments or as a barrier layer in semiconductor devices. The materials low dielectric constant and low loss tangent make it advantageous for radio frequency (RF) and microwave applications, such as in filters, capacitors, and substrates for high-frequency integrated circuits. AlF3 can be deposited using techniques like sputtering, and its optical transparency and ion-conducting properties also give it potential applications in optical coatings, solid-state batteries, and catalysis.

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