Hafnium Fluoride (HfF4) Sputtering Targets

Hafnium Fluoride (HfF4) Sputtering Targets

Catalog Number:
ST01502905QSA
Mfr. No.:
DPHL72ST
Price:
$2,222
  • Size:
    Quantity:
    Add to Cart:
      • Overview
        • Hafnium Tetrafluoride (HfF4) is used primarily in optical coatings due to its transparency in the infrared spectrum and stability. It is employed in the fabrication of lenses and other optical components. Sputtering can be used to deposit thin films of HfF4, enhancing the optical properties of components in infrared and laser systems.

          Please contact us at for specific academic pricing.

      • Properties
        • Categories
          High Purity Materials
          CAS Number
          13709-52-9
          Molecular Formula
          HfF4
          Other Properties
          Composition: Hafnium Fluoride (HfF4)
          Purity: 99.9%
          Max. dia. of flat disc sputter target: 12"
          Typical lead time of HfF4 sputtering target: 4 weeks

    Documents

    Datasheet

    Note: If you don't receive our verification email, do the following:

    Copyright © Amerigo Scientific. All rights reserved.