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Overview
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Sputtering technique are frequently used to create a thin film of Zirconium Carbide . The ZrC target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium Carbide in this case, to create athin film of ZrC on the surface of the substrate.
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