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Zirconium Carbide (ZrC) Sputtering Targets

Zirconium Carbide (ZrC) Sputtering Targets

Catalog Number:

ST01502920QSA

Mfr. No.:

DPCB40ST

Price:

$761

Size:

Quantity:

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- Overview
  - Sputtering technique are frequently used to create a thin film of Zirconium Carbide . The ZrC target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium Carbide in this case, to create athin film of ZrC on the surface of the substrate.
    
    Please contact us at for specific academic pricing.
- Properties
  - Categories
    
    High Purity Materials
    
    CAS Number
    
    12070-14-3
    
    Molecular Formula
    
    ZrC
    
    Other Properties
    
    Composition: Zirconium Carbide (ZrC)
    Purity: 99.5%
    Max. dia. of flat disc sputter target: 8"
    Typical lead time of ZrC sputtering target: 5 weeks

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