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Overview
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Sputtering technique are frequently used to create a thin film of Yttrium Fluoride . The YF3 target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Yttrium Fluoride in this case, to create athin film of YF3 on the surface of the substrate.
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- Properties
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Overview
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