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Overview
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Sputtering technique are frequently used to create a thin film of Zirconium Oxide . The YSZ target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium Oxide in this case, to create athin film of YSZ on the surface of the substrate.
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- Properties
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Overview