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Overview
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Sputtering technique are frequently used to create a thin film of Zirconium Oxide . The YSZ target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium Oxide in this case, to create athin film of YSZ on the surface of the substrate.
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Overview
Yttria Stabilized Zirconia (YSZ) Sputtering Target
Yttria Stabilized Zirconia (YSZ) Sputtering Target
Catalog Number:
ST01502764QSA
Mfr. No.:
DPOX40YST
Price:
$746
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