Tungsten Titanium (W/Ti) Sputtering Targets

Tungsten titanium (WTi) is an alloy composed of tungsten and titanium, known for its high electrical conductivity, thermal stability, and excellent adhesion to various substrates. It has a cubic crystal structure and can be deposited as thin films using sputtering techniques. Sputtered WTi films have found widespread applications in the semiconductor industry as diffusion barriers and interconnect materials. The high melting point and low resistivity of WTi make it suitable for preventing the interdiffusion of metals and enhancing the reliability of integrated circuits. Additionally, WTi films have been explored for their use as electrodes in various electronic devices, such as capacitors and resistive random-access memory (RRAM). The ability to deposit WTi by sputtering has greatly facilitated the fabrication of advanced electronic devices and has contributed to the miniaturization and performance enhancement of semiconductor technology.

Please contact us at for specific academic pricing.