Titanium Boride (TiB2) Sputtering Targets

Titanium Boride (TiB2) Sputtering Targets

Catalog Number:
ST01502891QSA
Mfr. No.:
DPBO22ST
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      • Overview
        • Titanium Diboride (TiB2) is a hard, ceramic material known for its high melting point, excellent hardness, and good electrical conductivity. It is used in cutting tools, wear-resistant coatings, and components that require high thermal and electrical performance. Thin films of TiB2 can be deposited using sputtering, providing durable and conductive coatings ideal for harsh environments. Sputter-deposited TiB2 films are particularly valuable in applications where both mechanical strength and electrical conductivity are required, such as in protective coatings for aerospace components and electronic devices.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          12045-63-5
          Molecular Formula
          TiB2
          Other Properties
          Composition: Titanium Boride (TiB2)
          Purity: 99.5%
          Max. dia. of flat disc sputter target: 8"
          Typical lead time of TiB2 sputtering target: 4 weeks

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