Terbium Oxide (Tb4O7) Sputtering Targets

Terbium oxide, with the chemical formula Tb4O7, is a rare-earth oxide possessing a cubic crystal structure. It has attracted research interest due to its potential applications in catalysis, gas sensing, and optical materials. Terbium oxide exhibits unique properties, such as high surface area, good thermal stability, and favorable electronic structure, which make it suitable for various technological applications. Thin films of Tb4O7 can be deposited using sputtering techniques, allowing for the fabrication of uniform and well-controlled layers. These sputtered Tb4O7 films have been investigated for their use in gas sensing devices, where they can detect the presence of specific gas species with high sensitivity and selectivity. Additionally, terbium oxide has been explored as a component in high-k dielectric materials, which are crucial for the development of advanced electronic devices. The ability to deposit Tb4O7 by sputtering has facilitated the study and application of this material in diverse fields.

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