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Tantalum Carbide (TaC) Sputtering Targets

Tantalum Carbide (TaC) Sputtering Targets

Catalog Number:

ST01502916QSA

Mfr. No.:

DPCB73ST

Price:

$857

Size:

Quantity:

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- Overview
  - Tantalum Carbide (TaC) is a hard ceramic with high melting point and excellent wear resistance. It is used in cutting tools, wear-resistant coatings, and as a refractory material in high-temperature applications. Thin films of TaC can be deposited using sputtering and chemical vapor deposition (CVD), providing durable and heat-resistant coatings for industrial applications.
    
    Please contact us at for specific academic pricing.
- Properties
  - Categories
    
    High Purity Materials
    
    CAS Number
    
    12070-06-3
    
    Molecular Formula
    
    TaC
    
    Other Properties
    
    Composition: Tantalum Carbide (TaC)
    Purity: 99.5%
    Max. dia. of flat disc sputter target: 8"
    Typical lead time of TaC sputtering target: 4 weeks

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