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Overview
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Sputtering technique are frequently used to create a thin film of Copper Sulfide . The CuS target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Copper Sulfide in this case, to create athin film of CuS on the surface of the substrate.
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- Properties
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Overview
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