Boron Nitride Target Frames

A target frame is the structure or holder that holds the sputter target in place during the sputtering process. The target frame is typically a metal frame designed to securely hold the sputter target material, which is usually in the form of a solid disk or rectangular plate.
The target frame plays a crucial role in ensuring proper alignment, stability, and electrical contact between the sputter target and the sputtering system. It is typically made of a conductive material that allows electrical connection to the target, facilitating the transfer of electrical current required for the sputtering process.
During sputtering, the target frame is mounted within the sputtering chamber and positioned facing the substrate to be coated. The frame holds the target in a fixed position, allowing the sputtering process to take place accurately and efficiently.
Boron nitride ceramics is a series ofmaterials that have great electric insulating, low dielectric constant, and high dielectric strength. In general, it is an ideal material for insulators to be used in PVD equipment, that needs to constrain the electric arc towards the target and protect the other components in the vacuum chamber. With relatively lower wettability to metal, target material deposited on the BNtarget framescould be removed easier.

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