Vanadium (V) Sputtering Targets

Vanadium (V) Sputtering Targets

Catalog Number:
ST01502868QSA
Mfr. No.:
DPME23ST
Price:
$541
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      • Overview
        • Vanadium is a transition metal with a wide range of applications in various fields, including metallurgy, catalysis, and energy storage. It has a body-centered cubic crystal structure and exhibits multiple oxidation states, enabling its use in diverse chemical and electrochemical processes. Thin films of vanadium and its compounds can be deposited using sputtering techniques, allowing for the fabrication of functional coatings and layers. Sputtered vanadium films have been investigated for their potential use as catalysts in chemical reactions, such as the selective oxidation of hydrocarbons. The high surface area and reactive nature of sputtered vanadium films enhance their catalytic activity and selectivity. Additionally, vanadium oxide (VOx) films have shown promise in energy storage applications, particularly in lithium-ion batteries and supercapacitors. The ability to deposit vanadium and its compounds by sputtering has greatly expanded their range of applications and has contributed to the development of advanced catalytic and energy storage technologies.

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      • Properties
        • Categories
          High Purity Materials
          CAS Number
          7440-62-2
          Molecular Formula
          V
          Other Properties
          Composition: Vanadium
          Purity: 99.9%
          Max. dia. of flat disc sputter target: 18"
          Typical lead time of V sputtering target: 3 weeks

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