Spray Developing Cleaning Machine

Cat. No. Dimensions (WxDxH) Specification Unit Price Quantity
MFSE528092-01 510 × 410 × 350 mm Speed: 3000 RPM Each Inquiry

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Product Description
Product Description
The developing and cleaning all-in-one machine (WH-XQY-01) is a product with independent intellectual property rights. It is designed and developed for the development and cleaning process in the photolithography process, and can be programmed and automated to develop and clean. This equipment can completely replace the manual development and cleaning steps in the production process of microfluidic chips, and overcome the uncontrollable amount of developer added in the manual development process, uncontrollable silicon wafer development time, and uncontrollable development effect between silicon wafers of the same specification, etc. Disadvantages, to minimize the development quality problems caused by the operator's human factors and the damage of the silicon wafer.
Specifications
Weight: 20kg
Adapting silicon wafer/chip: 8 inch
Speed: 3000rpm
Development time control: 1: 999 s
Cleaning time control: 1: 999 s
Dry time control: 1: 999 s
External dimension: 510x450x350 (L x W x H)mm
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